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Silicon dioxide polishing solution
Silicon dioxide polishing solution
Product details
Silicon dioxide polishing solution:
Our company has developed a polishing solution for rough polishing of silicon wafers based on self-developed high-purity silica abrasives. This polishing solution has a high dilution ratio and is easy to clean on the surface after polishing. The product is widely used in various industries.
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Testing items |
test method |
Indicator value |
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appearance |
visualization |
Milky white liquid |
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Solid content (%) |
gravimetric method |
40±2 |
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PH value (20 ℃) |
pH meter |
11.5-12.5 |
|
Particle size (nm) |
Laser Particle Size Analyzer |
80±10 |
|
Large particle count (parts/ml) |
Large particle counter |
﹤1000000 |
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