KejingThree target magnetron sputtering instrument

model:VTC-600-3HD

Product Overview:

VTC-600-3HD Three Target Magnetron Sputtering InstrumentzuiThe newly developed coating equipment can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc. Compared with similar devices, it is not only widely used, but also has the advantage of being small in size and easy to operate. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid-state electrolytes and OLEDs.

Main features:

• Can prepare various thin films with wide applications
• Small size, easy to operate
• The vacuum chamber and vacuum pump assembly are designed with modular design, and the control power supply is designed with a split type, which can be adjusted according to the actual needs of users.
• Users can choose the power supply according to their actual needs. One power supply can control multiple target guns, or multiple power supplies can control a single target gun

Magnetron sputtering head：

• There are three magnetron sputtering heads installed in the instrument, all of which have water-cooled interlayers
• One of the sputtering heads is connected to an RF power supply, mainly for sputtering insulating target materials
• The other sputtering head is connected to a DC power supply, mainly sputtering conductive target materials
• Target size requirements: diameter of 50mm, thickness of 0.1-5mm (thickness may vary due to different target materials)
• RF connection cables can be ordered separately as backup
• The equipment includes a water chiller for cooling the target head

Sample loading platform：

• Sample loading table size: φ 140mm（zuiCan be placed on a 4 'base)
• The sample stage can rotate at a speed of 1-20 rpm (adjustable)
• Sample loading platformzuiThe high heating temperature is 500 ℃

Vacuum Chamber：

• Vacuum chamber: φ 300 mm × 300 mm H, made of stainless steel
• Observation window: Φ 100 mm
• The opening method of the cavity adopts top opening, making it easier to change targets

gas flow controller：

• There are two mass flow meters installed inside the instrument, with a range of 0-100 sccm
• The gas flow rate setting can be operated on a 6-inch touchscreen
• This system requires Ar gas for operation, and a pressure reducing valve is installed on the gas cylinder (not included in the equipment)

vacuum system：

• Equipped with a GZK-103D molecular pump system (made in Germany)
• Standard 5E-5mbar limit 7.4E-6mbar

Thin film thickness measurement：

• A precision quartz vibrating thin film thickness gauge is installed on the instrument, which can monitor the thickness of the film in real time with a resolution of 0.10 Å
• LED display screen displays and also inputs relevant data of the produced film

Product dimensions：

• L1300mm×W660mm H1200mm
• Net weight: 160 kg

KejingThree target magnetron sputtering instrument

model:VTC-600-3HD

Quality certification:CE certification

hints：

• This device is a DIY device with significant parameter changes. Please make sure to communicate carefully over the phone before purchasing
• In order to achieve better film quality, high-purity gas (recommended>5N) must be introduced
• Before sputtering coating, ensure the cleanliness of the sputtering head, target material, substrate, and sample stage
• To achieve good adhesion between the film and the substrate, please clean the surface of the substrate before sputtering
• Ultrasonic cleaning (detailed parameters click on the image below): (1) Acetone ultrasonic (2) Isopropanol ultrasonic - remove oil (3) Blow nitrogen drying (4) Vacuum oven to remove moisture.
• Plasma cleaning: can roughen the surface, activate surface chemical bonds, and remove additional pollutants.
• Manufacturing a thin buffer layer (about 5 nanometers) such as Gr, Ti, Mo, Ta can be applied to improve the adhesion of metals and alloys.

Warning：

• Attention: There are high-voltage components installed inside the product. It is prohibited to disassemble or move the body with electricity without authorization
• A pressure reducing valve (not included as standard equipment) should be installed on the gas cylinder to ensure that the output pressure of the gas is limited to 0.02 megapascalsBelow, for safe use
• The sputtering head is connected to a high voltage. For safety reasons, the operator must install samples and replace targets before shutting down the equipment