ZMM-550 Type Inverted Three Eyesmetallographic microscope
1、 The purpose of the instrument:
The ZMM-550 three eye inverted metallographic microscope is easy to operate and has complete accessories. It is widely used in teaching and research metallographic analysis, semiconductor silicon chip detection, address mineral analysis, precision engineering measurement and other fields. The high-precision coarse and fine adjustment focusing mechanism uses a bottom hand position coarse and fine adjustment coaxial focusing mechanism, which can be adjusted on both sides with high precision. Manual adjustment is simple and convenient, and users can easily obtain clear and comfortable images. The rough adjustment stroke is 38mm, and the fine adjustment accuracy is 0.002. The large-sized mechanical mobile platform adopts a 180 × 155mm large-sized platform with a right-hand position setting, which conforms to the operating habits of the general population. During the user operation process, it is convenient to switch between the focusing mechanism and the platform movement, providing users with a more efficient working environment. The compact and stable high rigidity body fully embodies the anti vibration requirements of microscope operation.
Inverted metallographic microscope is a traditional type of inverted metallographic microscope. During operation, the observation surface of the sample is downward and coincides with the worktable. There are no requirements for the height and parallelism of the sample, making it suitable for irregularly shaped or larger samples. The organizational structure of various metals and alloys can be observed and identified. Its comfortable and stable mirror body mechanism, efficient and convenient stage design, and easy and fast operation method are suitable for long-term easy operation in schools, industrial and mining enterprise laboratories.
2、 Instrument features:
The inverted metallographic microscope system is a high-tech product developed by perfectly combining precision optical microscope technology, advanced photoelectric conversion technology, and cutting-edge computer image processing technology. Real time dynamic images can be easily observed on the display screen, and the required images can be edited, saved, and printed.
3、 Technical parameters
1. Eyepiece
Type |
magnification |
Field of view (mm) |
High eye point, large field of view, flat field eyepiece |
10X |
Φ18 |
2. Objective lens
Type |
magnification |
Numerical aperture (NA) |
Working distance (mm) |
Conjugate distance (mm) |
Long working distance flat field achromatic metallographic objective lens |
5X |
0.10 |
15.5 |
195 |
10X |
0.25 |
8.7 |
195 |
|
20X |
0.40 |
8.8 |
195 |
|
50X |
0.75 |
5.1 |
195 |
3. Optical magnification: 50X 100X 200X 500X, system magnification: 50X-2500X (taking a 19 inch display screen as an example)
4. Three eye observation head: tilted at 45 °, pupil distance 54-75mm, spectral ratio: 80:20
5. Four hole converter: inward facing ball with internal positioning
6. Focusing mechanism: Low hand position coarse fine adjustment coaxial focusing mechanism, coarse movement with a stroke of 38 mm per revolution; fine adjustment accuracy of 0.02mm
7. Stage: Three layer mechanical mobile platform with an area of 180mmX155mm, controlled by the right hand low position, stroke: 75mm × 40mm
8. Fallen illumination system: Fallen Kola illumination system with variable aperture light bar and center adjustable field of view light bar, equipped with polarizer insert board, fixed analyzer insert board, 360 ° rotating analyzer insert board
9. Power supply: adaptive wide voltage 100V-240V, 6V30W halogen lamp, continuously adjustable light intensity
10. Unique anti mold system
4、 Instrument composition
Computer type (ZMM-550C): 1. Microscope 2. Adaptor 3. Camera 4. Image acquisition and processing 5. Computer (optional)
Digital type (ZMM-550E): 1. Microscope 2. Adaptor lens 3. Digital camera
5、 Optional parts
1. Eyepiece: 15X 20X (with micrometer)
2. Objective lens: 40X 60X 80X 100X (dry)
3. Software: Metallographic analysis software, measurement software
1、 Eyepiece:
Type |
magnification |
Field of view (mm) |
High eye point, large field of view, flat field eyepiece |
10X |
Φ18 |
2、 Objective lens:
Type |
magnification |
Numerical aperture (NA) |
Working distance (mm) |
Conjugate distance (mm) |
Long working distance flat field achromatic metallographic objective lens |
5X |
0.10 |
15.5 |
195 |
10X |
0.25 |
8.7 |
195 |
|
20X |
0.40 |
8.8 |
195 |
|
50X |
0.75 |
5.1 |
195 |
