Product Function Introduction:

The argon ion polishing system is a desktop sample preparation equipment used for cross-sectional preparation and planar polishing of samples, for the purpose of detecting and analyzing samples on SEM and other equipment. There are a wide range of materials that can be polished using IlionII, including samples composed of multiple elements, as well as alloys, semiconductor materials, polymers, and minerals with different mechanical hardness, size, and physical properties. SEM and EBSD samples of various materials such as weld cross-sections, integrated circuit solder joints, multi-layer film cross-sections, particle and fiber cross-sections, composite materials, ceramics, metals and alloys, rock minerals, and other inorganic non-metallic materials.

Main technical parameters of the product:

1. Ion gun: Two ternary structures (cathode, anode, and focusing electrode) equipped with rare earth magnets. The Penning ion gun features a focused ion beam design and high performance without consumables

2. Polishing angle:+10 ° to -10 °, each ion gun can be independently adjusted

3. Ion beam energy: 100 V to 8.0 kV

4. Ion beam density: 10 mA/cm2 peak

5. Polishing speed: 300 μ m/h (for silicon samples under 8.0 kV conditions)

6. Sample loading: Ilion sample baffle, simple sample loading, accurate re polishing position, reusable, can be directly transferred to SEM for observation with Sample Stub

7. Sample rotation: continuously adjustable from 0.5 to 6 rpm

8. Beam modulation: ion beam modulation function, capable of fan-shaped section polishing (fan-shaped angle adjustable from 10 to 90 degrees) and flat surface polishing

9. Sample observation: Digital zoom microscope equipped with PC and Digital Micrograph software for image acquisition. Real time imaging (300x-2200x) and image storage and analysis can be performed through Gatan Digital Micrograph software

10. Liquid Nitrogen Cooling Stage: Equipped with a liquid nitrogen cooling stage, the sample can reach a low temperature of -120 ° C, effectively reducing the damage caused by ion beams to the sample

Vacuum system:

11. Dry pump system: Two stage diaphragm pump supports 80 liters/second turbo molecular pump

12. Pressure: 5x10-6 Torr basic pressure, 8.5x10-5 Torr working pressure

13. Vacuum gauge: cold cathode type, used for the main sample chamber; Solid type, used for front-end mechanical pumps

14. Sample air lock: Whisperinok design, sample replacement time<1 minute, no need to break the sample chamber vacuum

User interface:

15.10 inch touch screen: easy to operate and capable of fully programmable control of all parameters for recipe operation.

16. Operation mode: Customize different combinations of processing parameters to achieve one click operation.

Main application areas of the product:

EBSD sample preparation

Preparation of cross-sectional samples

Metal materials (alloys, coatings)

Petroleum Geology, Rock and Mineral Resources

Optoelectronic materials

Chemical polymer materials

New energy battery materials

Electronic semiconductor devices

SEM image of PCB circuit board cross-section polishing

Galvanized steel plate section polishing

Zn grains

Fe grains