The definition of optical microelectronics purification engineering is to remove pollutants such as fine dust particles, harmful air, and bacteria from the air within a certain spatial range, and to control indoor temperature and humidity, cleanliness, indoor pressure, airflow velocity and distribution, noise and vibration, lighting, and static electricity within a certain required range, and to provide a specially designed enclosed space.
Optical microelectronics purification engineering, also known as clean rooms or cleanrooms, is currently an indispensable and important facility in industries such as semiconductor, precision manufacturing, liquid crystal manufacturing, optical manufacturing, circuit board manufacturing, biochemistry, pharmaceuticals, and food manufacturing. In recent years, due to the innovative development of technology, the demand for high precision and miniaturization of products has become more urgent. For example, the research and manufacturing of ultra large integrated circuits has become a highly valued project in technological development around the world, and our company's design philosophy and construction technology are in a leading position in the industry.
Optical microelectronics purification engineering generally includes:
1. Clean production area
2. Clean auxiliary room (including personnel purification room, material purification room, and some living rooms, etc.)
3. Management area (including office, duty, management, and rest, etc.)
4. Equipment area (including purification air conditioning system application, electrical room, high-purity water and high-purity gas room, cold and hot equipment room)
Purification principle of optical microelectronics purification engineering
Airflow → Initial purification → Air conditioning → Medium efficiency purification → Fan air supply → Pipeline → High efficiency purification outlet → Blowing into the room → Carrying away dust and bacteria
By repeating the process of waiting for particles, returning air louvers, and initial purification, the purification goal can be achieved.
Purification parameters for optical microelectronics purification engineering
Ventilation rate: 100000 level ≥ 15 times; 10000 levels ≥ 20 times; 1000 ≥ 30 times. Pressure difference: ≥ 5Pa between adjacent rooms in the main workshop
Average wind speed: 0.3-0.5m/s for levels 10 and 100; Temperature in winter is above 16 ℃; Summer<26 ℃; Fluctuations of ± 2 ℃.
Temperature range of 45-65%; The humidity in the GMP powder workshop should be around 50%; The humidity in the electronic workshop is slightly high to avoid static electricity.
Noise ≤ 65dB (A); The amount of fresh air supplement is 10% -30% of the total air supply volume; Illuminance of 300LX.