VIP member
CZA series nitrogen removal argon purification machine
The principle of CZA-4N/FX series inert gas purifier is to utilize the properties of alloy adsorbents that can react with impurities such as oxygen, n
Product details
CZA-4N/FX series inert gas purifier
CZA-4N/FX seriesThe principle of an inert gas purifier is to use the properties of alloy adsorbents that can react with impurities such as oxygen, nitrogen, water, carbon dioxide, and hydrocarbons at high temperatures to generate stable compounds or solid solutions, in order to remove the above-mentioned impurities from inert gases such as argon, helium, neon, xenon, etc., thus achieving the purpose of purification. The purified high-purity gas has been widely used in the analysis and scientific research of industries such as semiconductors, electronics, metallurgy, lithium battery manufacturing, and optical fibers.
Product Features
The purification level is deep, not only can it remove O2Waiting for more active impurities, and can also remove N2Waiting for inert impurities is something that ordinary purifiers cannot achieve;
The n purifier adopts a dual tower structure, with one working and the other standby, and two purifiers on top for use;
The working temperature is low and the energy consumption is low.
This series of purifiers is equipped with a pre purification tower, which removes more active impurities before the alloy adsorption tower, greatly extending the service life of the alloy adsorption tower
Technical Parameter
Equipment name | Equipment model | way of working | remarks |
Inert gas purifier | CZA-4N | semi-automatic | Ar |
FX□-Z | semi-automatic | Choose Ar, He, Xe, Ke, or Ne | |
Original gas requirements Ar、He |
Purity | ≥ 99.99% bottled pure argon, liquid argon | |
Impurity requirements | O2≤200PPm, H2O≤1000PPm,N2≤100PPm | ||
Output pure gas | Purity | ≥99.9999% | |
impurity content | O2≤0.5PPm; N2≤0.5PPm; H2O ≤ 1PPm (i.e. dew point ≤ -76 ℃); CO+CO2≤0.1PPm; Number of dust particles (≥ 0.3 μ m) 3-5 per liter |
||
Working pressure | 0~1.0MPa | ||
Processing gas volume | 1~4Nm3/h | ||
remarks | Can be designed and manufactured according to user requirements |
Online inquiry