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CLONE dual-mode plasma etching machine cleaning machine
CLONE dual-mode plasma etching machine cleaning machine
Product details
Desktop plasma cleaning and etching system, plasma etching&Reactive ion etching system
Chamber structure:

Model comparison:

Application:
·EtchingOxide etchingRIEMode, nitride etchingRIEMode, silicon etchingRIEMode, photoresist etchingRIEPattern, polymer(RIE+PE)Two dimensional materialsRIE
·Surface TreatmentHydrophilic treatmentPEMode, functionalizationPEMode, enhanced adhesion:PE+RIEPolymer: RIE+PE

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