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technical parameter

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CIC-D160

Infusion pump

Pump type: chemically inert non-metallic undamped pump head, PEEK tubing, suitable for pH 0-14 rinsing solution and reverse phase organic solvents, capable of automatic plunger cleaning

Maximum pressure resistance: 35MPa (PEEK material) Flow range: 0.001-9.999mL/min

Pressure display accuracy: ≤ 0.1MPa pressure pulsation: ≤ 0.5%

Allowable error of flow setting value: (0.2-0.5) mL/min, ± 5%;

（0.5-1.0）mL/min，±3%；

Greater than 1.0mL/min, ± 2%

Traffic stability: （0.2-0.5）mL/min≤3%；

（0.5-1.0）mL/min≤2%；

Greater than 1.0mL/min ≤ 2

Six way valve

Solenoid valve: VF-02-1107

Maximum withstand voltage: 35MPa Control mode: Stepper motor control

Rotor contact material: PEEK Power supply: 24V DC power supply

Conductivity cell

Temperature control compensation technology ensures more accurate temperature control and more stable detection results.

Structure: Bipolar shielded conductivity cell (passivated 316 stainless steel)

Pool volume: ≤ 0.8μL； Detection range: 0-50000 μ S/cm;

Detection resolution: 0.0020nS/cm Output voltage:- 6000~+6000mV adjustable

Baseline noise: ≤ 0.05% FS baseline drift: ≤ 3%FS/30min

Constant temperature accuracy: 5-60 ± 0.01 ℃ Maximum withstand voltage: 10MPa

Minimum detection limit: Cl-≤0.0005μg/mL

Li+≤0.001μg/mL

BrO3-≤0.001μg/mL

Linear range: ≥ 103 Instrument linearity: ≥ zero point nine nine nine

Qualitative repeatability: ≤ 1.0% Quantitative repeatability: ≤ 1%

Suppressor

Anion inhibition function: compatible with carbonate, hydroxide systems and other eluents
Advanced continuous self regenerating micro film electrochemical suppression technology, without the need for additional regeneration fluid;
High inhibitory capacity, low background conductivity;
Low noise, good stability;
High pressure resistance, no leakage at up to 6MPa, normal operation at 2MPa;
Smaller dead volume, more sensitive response signal;

Cation inhibition function: compatible with leaching solutions such as nitric acid and methane sulfonic acid systems
Advanced continuous self regenerating micro film electrochemical suppression technology, without the need for additional regeneration fluid;
High inhibitory capacity, low background conductivity;
Low noise, good stability;
High pressure resistance, no leakage at up to 6MPa, normal operation at 2MPa;
Smaller dead volume, more sensitive response signal;

Column temperature box

Heating method: Built in circulating three-dimensional constant temperature column temperature box
Temperature control range: 20-60 ℃
Allowable error of temperature setting value for column temperature box: ± 2 ℃; Temperature control accuracy: ± 0.01 ℃
Temperature stability: 1 ℃/h

Rinse solution generator

Equal elution results in higher consistency among different batches of samples; Gradient elution is used to complete complex sample detection that cannot be achieved by isotropy.

Rinsing solution type: KOH/NaOH Rinsing solution concentration range: 0.1-120.0mM

Concentration increment: 0.1mM Concentration control accuracy: ± 0.1mM

Maximum operating pressure: 20MPa Minimum operating pressure: 5MPa

Flow rate range: 0.1-5.0mL/min

Low pressure degassing

Built in low-pressure degassing device

Vacuum degree:- 70 kPa maximum flow rate: 10 mL/min

Internal volume: 300 μ L Degassing efficiency: 90% degassing at 1 mL/min

workstation

Integrating data collection, instrument control and monitoring, data analysis, and report output;
Multiple data acquisition interfaces (A/D analog acquisition card, network USB、RD232)；
Compatible with various detectors, automatic samplers, rinse solution generators, etc;
Customized graphics, simplified operation process, and improved user experience.