Product Usage:

This CVD system is suitable for CVD processes such as silicon carbide coating, ceramic substrate conductivity testing, and controllable ZnO nanostructures

Process experiments such as growth, ceramic capacitor (MLCC) atmosphere sintering, vacuum quenching annealing, rapid cooling, etc.

Product composition:

CVD system configuration:

1200 degree open vacuum tube furnace (optional with multiple temperature zones).

2. The sliding system is divided into manual and electric sliding, and is equipped with an air-cooled system.

3. Multi channel quality flow control system

4. Vacuum system (optional with medium or high vacuum)

Product features:

The control circuit adopts fuzzy PID programming technology, which has high temperature control accuracy, small thermal inertia, no temperature surge, reliable performance, and simple operation.

The flange structure of the 2-way quick connection adopts our company's unique intellectual property patent design to improve operational convenience.

The 3 vacuum systems have automatic control functions for the upper and lower limits of vacuum degree. The high vacuum system uses high-pressure, impact resistant molecular pumps to prevent accidental air leakageDamaged molecular pump prolongs the service life of the system.

The 4 (electric) sliding system adopts a temperature controller to automatically control the movement of the furnace body. After the program is completed, the furnace body slides at the set speed due to the sliding limitThe functional furnace body will not collide, and after the sample is exposed from the furnace body, it will be quickly cooled down through an air cooling system.