Product application:

The PECVD system uses radio frequency to ionize a gas containing atoms composed of thin films, forming a plasma locally. The plasma has strong chemical activity and is easily reactive, depositing the desired thin film on the substrate.

Product composition:

PECVD system configuration:

1200 degree open dual temperature zone vacuum tube furnace

2. The sliding system is divided into manual and electric sliding, and is equipped with an in pipe temperature measurement system.

3. Preheating open tube electric furnace

4. Plasma RF power supply

5. Multi channel quality flow control system

6. Vacuum system (optional with medium or high vacuum)

Product features:

Low growth temperature; Fast sedimentation rate; Good film-forming quality, wide applicability, and simple equipment.