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1200 ℃ Dual Temperature Zone CVD System
Product Usage: This CVD growth system is suitable for CVD processes such as silicon carbide coating, ceramic substrate conductivity testing, controlla
Product details
Product Usage:
This CVD growth system is suitable for CVD processes such as silicon carbide coating, ceramic substrate conductivity testing, controllable growth of ZnO nanostructures, and atmosphere sintering of ceramic capacitors (MLCC).
Product composition:
This CVD system configuration:
1. 1200 degree open vacuum tube furnace (optional single temperature zone, dual temperature zone).
2. Multi channel quality flow control system
3. Vacuum system (optional with medium or high vacuum)
Product features:
The control circuit adopts fuzzy PID programming technology, which has high temperature control accuracy, small thermal inertia, no temperature surge, reliable performance, and simple operation.
The flange structure of the 2-way quick connection adopts our company's unique intellectual property patent design to improve operational convenience.
The three vacuum systems have automatic control functions for the upper and lower limits of vacuum degree, and the high vacuum system uses high-pressure, strong impact resistant molecular pumps
Prevent accidental gas leakage from causing damage to the molecular pump and extend the service life of the system.
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System name |
1200 ℃ Single/Dual Temperature Zone CVD System |
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system model |
CVD-12II-3Z/G |
CVD-12II6-3Z/G |
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maximum temperature |
1200℃ |
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Heating zone length |
420mm |
600mm |
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Length of constant temperature zone |
280mm |
390mm |
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temperature range |
Dual temperature zone |
Dual temperature zone |
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Quartz tube diameter |
Φ50/Φ60/Φ80mm |
Φ80/Φ100mm |
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rated power |
3.2Kw |
4.8Kw |
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rated voltage |
220V |
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temperature control |
Domestic program-controlled temperature control system with 50 segments of program-controlled temperature control; |
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Control accuracy |
±1℃ |
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Maximum operating temperature of furnace tube |
＜1200℃ |
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Gas path flange |
The connection between the sealing flange and the pipe fittings adopts multi ring sealing technology, forming a seal between the sealing flange and the outer wall of the pipe. The seal is still effective even in the case of large errors in the outer diameter of the pipe fittings. The installation of this sealing flange only needs to be done during the first use of the equipment |
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Gas control method |
Mass flowmeter |
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Number of gas paths |
3 channels (the number of air channels can be selected according to specific needs) |
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Flow range |
0-500sccm (standard milliliters/minute, optional) nitrogen calibration |
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accuracy |
±1%F.S |
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response time |
≤4sec |
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operation temperature |
5-45℃ |
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Working pressure |
Inlet pressure 0.05-0.3Mpa (gauge pressure) |
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System connection method |
Using KF quick connect bellows, high vacuum manual baffle valve, and digital vacuum measuring instrument |
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specifications |
high vacuum |
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System vacuum range |
1x10-3Pa-1x10-1Pa |
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vacuum pump |
Theoretical limit of vacuum molecular pump vacuum degree 5x10-6Pa pumping speed 1200L/S rated voltage 220V power 2KW |
Theoretical limit of vacuum molecular pump vacuum degree 5x10-6Pa pumping speed 1600L/S rated voltage 220V power 2KW |
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External dimensions of furnace body |
340×580×555mm |
480×770×605mm |
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System external dimensions |
530x1440x750mm (excluding high vacuum) |
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Total weight of the system |
330kg |
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